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Field
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cathodic sputtering; Complementary analytical instruments, including a gas chromatography system and a fluoride release measurement system; High-performance computing infrastructure.
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Growing epitaxial thin films and heterostructures by pulsed-laser deposition and magnetron sputtering and using epitaxial strain and interfacial effects to stabilize metastable phases with desired
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dynamics simulations to understand the growth mechanisms of thin films deposited by magnetron sputtering, with or without ion beam assistance (IBAS), particularly for metallic materials (Ag) and oxides (ZnO
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cleanroom facility. Deep expertise in lithography, E-beam evaporation, sputtering, and dry/wet etching is strictly required. Optical Bench Competency: Demonstrated success in designing, constructing, and
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GPa vs. 25–30 GPa) (Oses et al., Nat. Rev. Mater., 2020) while reducing the chromium content to 7–13 %wt. However, these results were obtained using sputtering, a costly method generally limited to thin
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Additional Information Eligibility criteria • PhD in experimental physics or a related field • Experience in cryogenics appreciated • Experience in thin film deposition by sputtering desirable • Experience in
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science or chemistry (e.g., sputtering and etching mechanisms, plasma-surface interactions, roughness evolution). Experience designing, building or operating IBF systems, Einzel lenses, high-voltage
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more traditional fusion structural materials (RAF steels, tungsten) being used once the high-throughput methodology has been set-up. The combinatorial coatings will be fabricated in the pre-vac sputter
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section/materials prep laboratory, microwave reactor, plasma sputter and vacuum carbon coaters, vacuum spin coater, a benchtop NMR, and an electron microprobe (EPMA) as part of the Concord Materials and
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. Diverse synthesis methodologies—including wet chemistry, bio-templated growth, chemical vapor deposition (CVD), electron-beam (E-beam) evaporation, and sputtering deposition—are leveraged to engineer and