Sort by
Refine Your Search
-
Listed
-
Country
-
Employer
- Argonne
- CNRS
- Computer Vision Center
- AALTO UNIVERSITY
- ARCNL
- Carnegie Mellon University
- Chosun University
- Cornell University
- EPFL
- Eindhoven University of Technology (TU/e)
- Heidelberg University
- Heriot Watt University
- Institute of Photonic Sciences
- Montana State University
- National Aeronautics and Space Administration (NASA)
- Northeastern University
- Pennsylvania State University
- Purdue University
- Queen Mary University of London;
- Stanford University
- The Ohio State University
- Trinity College Dublin
- University of Central Florida
- University of North Carolina at Charlotte
- University of Southern California
- 15 more »
- « less
-
Field
-
-doctoral Researcher position in advanced nanofabrication and ultrathin membrane processing. The post is funded by an industry partner (Lace Lithography) and will be employed through Trinity College Dublin
-
nanofabrication, such as lithography, thin-film deposition, and etching Experience designing photonic, THz, or microwave cavities Experience with ultrafast optics, THz or on-chip picosecond electronics
-
, electron-beam lithography, theory of light-matter interaction, computer simulations using the method of Finite Differences in the Time Domain (FDTD), determination of optical material constants by multiangle
-
(lithography, etching, liftoff) relevant to device integration. Proficiency in data analysis for handling and modeling experimental data. The Successful Candidate Will Ability to work both independently and
-
include: Device design and nanofabrication of van der Waals heterostructures based on twisted 2D materials (dry transfer, cleanroom lithography, encapsulation) Cryogenic optoelectronic and magneto-transport
-
experiments Experience with microchannel, microfluidic, flow-cell, or microreactor systems is strongly preferred Experience with PDMS-based microfluidic device fabrication or soft lithography is an advantage
-
materials, with hands-on expertise in nano- and micro-fabrication techniques such as e-beam lithography, FIB, nanoimprint lithography, or micro/nanoscale 3D printing. You will demonstrate strong knowledge
-
facilities available in the C2N cleanroom. Electron-beam lithography, laser lithography, reactive ion etching, wet chemical etching, and metal deposition techniques will be employed. - low-temperature
-
or micromagnetic simulation (e.g., Vampire, OOMMF, MuMax3); extraction of compact device models from first-principles results. Experiment End-to-end device fabrication: e-beam lithography, metallization, lift-off
-
, including thin-film deposition (e.g., magnetron sputtering), electron-beam or optical lithography, and dry/wet etching Familiarity with microwave resonator design, characterization, and RF/microwave