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Field
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) / InP contact layer (200 nm) / Si substrate The objective of the project is to develop a plasma etching process for this multilayer stack, enabling selective etch stopping on the InP contact layer, which
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WE REFINE SURFACES – AND IMPROVE OUR EXPERTISE. CHANGE STARTS WITH US. The Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP in Dresden is dedicated
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Technologist - Thin Film & Plasma Processing plays an important role in supporting the Micro Nano Research Facility (MNRF), providing specialist technical expertise across thin film deposition, plasma processing
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Position Title: Postdoctoral Research Associate – Plasma Science and Sustainable Chemical Processes Appointment Type: Post Doc/Trainee Job Description: Summary of Duties and Responsibilities: We
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for developing and optimizing plasma-based functionalization processes for ferrimagnetic nanoparticles. The successful candidate will be responsible for investigating the relationships between plasma parameters
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development, operation and optimization of plasma devices and associated diagnostics. Experience or exposure to plasma diagnostics. Strong written and verbal communication skills with demonstrated ability
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Requisition Id 17180 Overview: We are seeking a Computational Physicist to carry out modeling of plasma transport and plasma-material interactions (PMI) in the Materials Plasma Exposure eXperiment
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23 Sep 2026 Job Information Organisation/Company Institute of Plasma Physics and Laser Microfusion Research Field Physics » Other Researcher Profile First Stage Researcher (R1) Positions Bachelor
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delta-f gyrokinetic simulations and full-f, cross-separatrix gyrokinetic modeling of the plasma edge, scrape-off layer, and associated transport processes. The researcher will use theory, numerical
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. Responsibilities* Conduct research on the structure, dynamics, and plasma processes of planetary magnetospheres. Analyze particle and field measurements acquired by spacecraft missions, with particular emphasis