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) / InP contact layer (200 nm) / Si substrate The objective of the project is to develop a plasma etching process for this multilayer stack, enabling selective etch stopping on the InP contact layer, which
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for developing and optimizing plasma-based functionalization processes for ferrimagnetic nanoparticles. The successful candidate will be responsible for investigating the relationships between plasma parameters
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31 Jul 2026 Job Information Organisation/Company CNRS Department Laboratoire de Physique des Plasmas Research Field Engineering Chemistry Physics Researcher Profile First Stage Researcher (R1
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CNRS Earth & Universe institutes). The laboratory is recognised for its research activities in the following areas: • Plasma physics and fusion, particularly via magnetic confinement, in close
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and the plasma surface can oscillate at relativistic velocities, acting as a nonlinear mirror capable of up-converting the incident radiation to much higher frequencies. This process enables
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Paris) at LIRA, Paris Observatory, Meudon. The two supervisors will contribute their expertise in plasma physics and data processing. C. Louis will facilitate access to data from the Juno mission (as an
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skills: o Knowledge of plasma physics, laser physics, laser-matter interaction o Proficiency in scientific programming languages (Python required, C/C++ appreciated) o Skills in data processing, physical
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Université de Lorraine. Focused on materials and processes science and engineering, it covers: materials, metallurgy, plasmas, surfaces, nanomaterials and electronics. By 2026, IJL has 258 permanent staff (33
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in this field. C. Grouin will cover computer science aspects and automated language processing. We will also collaborate with Vincent Génot, former director of the Plasma Physics Data Center at IRAP in