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chemistry. The project aims to understand the active state of a surface live during plasma exposure using a unique methodology developed by our research group. It is part of a fully funded Starting Grant from
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landscape, there is an unprecedented need for much higher resolution and high-speed imaging systems. At ARCNL, we are committed to developing innovative technologies to address these challenges. You will
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media. The new approach will enable imaging and accurate characterization of nanostructures for the semiconductor industry. Optical metrology is a key ingredient of nanolithography, as it enables
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resolution and high-speed imaging systems. At ARCNL, we are committed to developing innovative technologies to address these challenges. You will collaborate closely with experts in machine learning (UvA
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methodology developed by our research group. It is part of a fully funded Starting Grant from the European Research Council entitled “Resolving surface reactions in plasma catalysis: Towards rational catalyst