12 membrane-technology positions at ARCNL in Netherlands

Scientific Internship: Sandwiching Salts

At the Advanced Research Center for Nanolithography (ARCNL) we carry out exciting fundamental physics research at the highest possible level with relevance to key technologies in nanolithography. We

Postdoc: Imaging and metrology via ultra-thin optical fibers

media. The new approach will enable imaging and accurate characterization of nanostructures for the semiconductor industry. Optical metrology is a key ingredient of nanolithography, as it enables

PhD position: Application Specific Computational Materials Design

Materials are ubiquitous parts of our everyday life and as technologies keep pushing boundaries, the search for new functional materials is getting more and more complex. In this PhD project, you

PhD: Resolving Surface Reactions in Plasma Catalysis (SURPLAS)

and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO

Postdoc: Theory of the atomic origins of EUV light (project MOORELIGHT)

This theory-oriented postdoctoral position lies at the interface between fundamental physics and industrial application. It is part of a fully funded Consolidator Grant from the European Research

PhD position: Laser-droplet interaction for EUV lithography (project MOORELIGHT)

This fully funded PhD position lies at the interface between fundamental physics and industrial application. It is part of a fully funded Consolidator Grant from the European Research Council titled

Postdoc: Efficient generation of EUV light from laser-driven plasma

efficiency in converting electrical power to useful EUV light. Replacing gas lasers with much more efficient solid-state lasers may significantly improve efficiency, as well as output power. It is currently

Postdoc: Machine learning for imaging and metrology

resolution and high-speed imaging systems. At ARCNL, we are committed to developing innovative technologies to address these challenges. You will collaborate closely with experts in machine learning (UvA

Postdoc: Resolving Surface Reactions in Plasma Catalysis (SURPLAS)

methodology developed by our research group. It is part of a fully funded Starting Grant from the European Research Council entitled “Resolving surface reactions in plasma catalysis: Towards rational catalyst

PhD-student: Superresolution terahertz microscopy of semiconductors and 2D materials

Interaction group focuses on developing the science and technology of new optical and optical/acoustic hybrid metrology modalities for nanolithography applications. Projects include ultra-high frequency