Postdoc: Imaging and metrology via ultra-thin optical fibers

As a postdoc, you will develop new concepts for nanoscale imaging and metrology by integrating computational imaging, multimode fibers, lensless microscopy, and advanced light control in complex media. The new approach will enable imaging and accurate characterization of nanostructures for the semiconductor industry.

Optical metrology is a key ingredient of nanolithography, as it enables to characterization of critical features of nanostructures printed on wafers. High-resolution imaging is an essential part of optical metrology: We need to perform fast imaging with the highest spatial resolution through a simple and compact imaging probe.

Computational compressive multimode fiber imaging is a novel imaging paradigm that uses a hair-thin multimode fiber and the fact that natural images are sparse on some basis to robustly recover sub-wavelength information. As a postdoc, you will develop new approaches of sparsity-based subwavelength imaging through optical fibers. New techniques will connect several modern and dynamic research areas that are still unconnected to date: computational imaging, complex wavefront shaping, compressive sensing, and metrology. This will enable fast and accurate characterization of 3D multi-layer nanostructures and pave the way for better metrology tools for tomorrow’s nanolithography.

You will perform this project in the research group ‘Nanoscale Imaging and Metrology’, and will collaborate with researchers from various other research groups at ARCNL and the VU University Amsterdam, as well as with researchers from semiconductor equipment manufacturer ASML. In addition to carrying out your research program, you are also expected to coach a PhD candidate working on a related topic.

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU), and associate partner the University of Groningen (RuG), and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, The Netherlands, and has a size of approximately 100 scientists and support staff

You have a PhD in physics and a strong affinity for experiments combined with an interest in computational imaging algorithms with metrology applications. Knowledge of (computational) imaging technology, experimental optics, advanced programming methods and/or semiconductor metrology is considered an advantage. Good verbal and written communication skills in English are required.

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of 3 years, with a salary in scale 10 (CAO-OI ) and a range of employment benefits . ARCNL assists any new foreign Postdoc with housing and visa applications and compensates their transport costs and furnishing expenses.

Dr. Lyuba Amitonova
Group leader Nanoscale Imaging & Metrology
E-mail: [email protected]
Phone: +31 (0)20-754 7100

You can respond to this vacancy online via the button below.
Please annex your:
–  Resume;
–  Motivation on why you want to join the group (max. 1 page).
It is important to us to know why you want to join our team. This means that we will only consider your application if it entails your motivation letter.

Applications will be evaluated on a rolling basis and as soon as an excellent match is made, the position will be filled.

Online screening may be part of the selection.

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