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ICFO is offering a Staff Research Engineer position for an experienced engineer with extensive expertise in optical lithography and nanofabrication. The successful candidate will be responsible for
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Job Description If you are an experienced engineer/physicist within e-beam and UV lithography, we can offer you an exciting workplace at the Technical University of Denmark. The cleanroom facility
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lithography, etch and deposition techniques, proper chemical handling, safety and storage, and support system maintenance and service. The full job description is available, here: https://mitnano.mit.edu
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functionalised REDS thin-disks as new optical components for innovative-lasers applications. We’re looking for an enthusiastic postdoctoral fellow to be part of our team to advance our electron-beam lithography
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(electron-beam lithography, 2PP-lithography, RIE, PVD etc.) and characterisation (AFM, SEM, FTIR microscopy, custom electro-optic systems, liquid/gas phase sensing etc.). You should demonstrate independent
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innovative-lasers applications. We’re looking for an enthusiastic postdoctoral fellow to be part of our team to advance our electron-beam lithography and plasma etch technology, ultimately develop a
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our electron-beam lithography and plasma etch technology, ultimately develop a layer of amplified spontaneous emission mitigation (ASE) nanostructures on a new class of active mirror to underpin the
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lithography and/or atomic layer deposition and/or gate dielectric characterization methods will be considered favorably. Dutie and Responsibilities Develop, operate, and characterize semiconductor
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Eindhoven University of Technology (TU/e) | Eindhoven, Provincie Noord-Brabant | Netherlands | about 2 months ago
refractive optics using tools such as Zemax. Develop and fabricate multilayer devices using electron-beam lithography, thin-film deposition, and reactive-ion etching, tackling challenges in nanoscale overlay
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, liquid/gas phase sensing, photonic modelling (FDTD, FEM, RCWA, etc. using Ansys Lumerical, COMSOL, FlexCompute etc.), micro- and nanophotonics, cleanroom fabrication (electron-beam lithography, 2PP