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-transfer printing. You will be responsible for: Developing novel fabrication methods for solid laser waveguides (e-beam lithography / dry-etch optimization / thin-film development) Testing and characterizing
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room has unique equipment for heterogeneous laser integration and micro-transfer printing. You will be responsible for: Developing novel fabrication methods for solid laser waveguides (e-beam lithography
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which comparable knowledge is demonstrated may be considered. Desired (not required) Skills: - Micro/nanofabrication (lithography, etching, metal deposition, etc.) Printed circuit board design Discrete
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lithography, dry/wet etching, and metallization Collaborate within a multidisciplinary team across CNM, MSD, APS, Q-NEXT to characterize device performance across structural, optical, electro-optic, and
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growth of thin films using CVD and related technique is preferred. Other knowledge of pulsed-laser deposition, sputtering deposition, photo- and electron beam lithography, and transport and
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or optical lithography Dry and wet etching Microwave resonator design and characterization RF and microwave measurement techniques Job Family Postdoctoral Job Profile Postdoctoral Appointee Worker Type Long
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demonstrated skills in the following areas: (i) Fabrication of 2D materials based nanodevices using exfoliation, transfer, optical and electrical beam lithography (EBL). Strong command of EBL is required. (ii
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(KIDs) Experience with cleanroom microfabrication processes, including thin-film deposition (e.g., magnetron sputtering), electron-beam or optical lithography, and dry/wet etching Familiarity with
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, and Experience Experience with x-ray techniques and/or synchrotron experiments. Experience with nanofabrication tools (particularly focused ion beam and lithography). Background in condensed matter
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National Aeronautics and Space Administration (NASA) | Pasadena, California | United States | 14 days ago
tape-out. Extensive hands-on cleanroom fabrication experience is essential, specifically with advanced nanofabrication techniques such as Electron Beam Lithography (EBL), high-resolution photolithography