Sort by
Refine Your Search
-
Listed
-
Country
-
Employer
- Argonne
- Ghent University
- CNRS
- Cornell University
- AALTO UNIVERSITY
- ARCNL
- Carnegie Mellon University
- Chosun University
- Eindhoven University of Technology (TU/e)
- Heidelberg University
- Heriot Watt University
- ICN2
- Institute of Photonic Sciences
- National Aeronautics and Space Administration (NASA)
- Pennsylvania State University
- Purdue University
- Queen Mary University of London;
- The Ohio State University
- University of Central Florida
- University of Lund
- University of North Carolina at Charlotte
- University of Oxford
- University of Southern California
- 13 more »
- « less
-
Field
-
skills in clean room environment (ex. Lithography, metal evaporation, wet bench chemistry etc.) Practical experience using standard characterisation methods for evaluation of morphology and materials
-
building experimental setups, rapid prototyping & technologies such as stereolithography, two-photon printing or nano-imprint lithography is highly desirable Experience with scientific computing and
-
physics), device synthesis, and quantum materials (including optics, photonics, spectroscopy, and optically active point defects). Also, familiarity with nanofabrication (optical and e-beam lithography
-
cleanroom facility. Deep expertise in lithography, E-beam evaporation, sputtering, and dry/wet etching is strictly required. Optical Bench Competency: Demonstrated success in designing, constructing, and
-
or more of the following: • quantum information processing and its implementations (e.g., with superconducting circuits) • micro and nano-electronic devices and their fabrication (lithography and deposition
-
. Extension may be possible contingent upon future funding. Previous hands-on experience with semiconductor device fabrication is required. Experience working with high resolution e-beam lithography, optical
-
Experience with microfabrication techniques such photolithography, soft lithography, micro moulding, cleanroom process, or related methods Experience in the development and implementation of experimental
-
have: Hands-on experience in micro/nanofabrication, preferably including lithography, thin-film deposition, dry/wet etching, lift-off, release processes, or MEMS/NEMS process integration. Demonstrated
-
have: Hands-on experience in micro/nanofabrication, preferably including lithography, thin-film deposition, dry/wet etching, lift-off, release processes, or MEMS/NEMS process integration. Demonstrated
-
with our industry partner ASML—the major player in the semiconductor lithography sector—to harness new techniques in nonlinear optics in gas-filled fibres to develop light sources with unique properties