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work on a Swiss National Science Foundation funded project investigating electrons as a reaction partner in atomic layer deposition (ALD) to explore new thin film materials. You will run in situ mass
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-beam and optical lithography, atomic layer deposition, reactive-ion etching, focused ion beam, and a new 700-square-meter cleanroom. Measuring: dilution refrigerators down to millikelvin, low
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International Iberian Nanotechnology Laboratory (INL) | Braga, Braga | Portugal | about 20 hours ago
is a plus. Previous experience working in cleanroom or advanced nanofabrication environments. Experience with physical vapour deposition, sputtering, atomic layer deposition or other advanced materials
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-characterization facilities. Available infrastructure includes atomic layer deposition, electron microscopy, scanning-probe methods, x-ray techniques, ellipsometry, and spectroscopy. The combination of
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facilities. Available infrastructure includes atomic layer deposition, electron microscopy, scanning-probe methods, x-ray techniques, ellipsometry, and spectroscopy. The combination of these
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layer deposition, electron microscopy, scanning-probe methods, x-ray techniques, ellipsometry, and spectroscopy. The combination of these facilities gives the researcher the possibility to move from