Sort by
Refine Your Search
-
Listed
-
Category
-
Country
-
Employer
-
Field
-
atomic layer deposition and annealing. Develop atomic scale processes to deliver high-quality ferroelectric thin films for next- generation computing applications. Work closely with modeling team in
-
pulsed laser deposition, atomic layer deposition and liquid-phase epitaxy of substituted garnet films, and comparing directly doped garnets against stacks in which the spin ions are hosted in an adjacent
-
couple efficiently to the spin ions while long optical and spin lifetimes are preserved, using pulsed laser deposition, atomic layer deposition and liquid-phase epitaxy of substituted garnet films, and
-
materials. Molecular, organic, or hybrid organic–inorganic materials. Cleanroom nanofabrication, including electron-beam or optical lithography, thin-film deposition, etching, or atomic layer deposition
-
materials. Molecular, organic, or hybrid organic–inorganic materials. Cleanroom nanofabrication, including electron-beam or optical lithography, thin-film deposition, etching, or atomic layer deposition
-
microelectronics with demonstrated excellence in atomic layer processing, plasma processing, thin film deposition, and microelectronics device fabrication. Ability and willingness to provide users with support
-
Vapor Deposition, Molecular Beam Epitaxy and Atomic Layer Deposition. Manage technical collaborations with research teams for the development of the nanofabrication facility. Maintain and trouble-shoot
-
-beam and optical lithography, atomic layer deposition, reactive-ion etching, focused ion beam, and a new 700-square-meter cleanroom. Measuring: dilution refrigerators down to millikelvin, low
-
-characterization facilities. Available infrastructure includes atomic layer deposition, electron microscopy, scanning-probe methods, x-ray techniques, ellipsometry, and spectroscopy. The combination of