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Research Agency] project between LATMOS and INRIA, the project aims to compute wet-bulb temperature, a habitability and thermal stress index, from satellite data, and in particular the IASI and IASI-NG
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of Research Experience1 - 4 Additional Information Eligibility criteria Technical skills: Plasma etching and wet etching processes; material characterization (XPS, ellipsometry, AFM, electron microscopy
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of Research Experience1 - 4 Additional Information Eligibility criteria Standard cleanroom microfabrication techniques, including photolithography, dry and wet etching, and device characterization. Mechanical
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facilities available in the C2N cleanroom. Electron-beam lithography, laser lithography, reactive ion etching, wet chemical etching, and metal deposition techniques will be employed. - low-temperature