3 thin-film-post positions at Ghent University

PhD Position in Physics : Atomic layer deposition for tailoring electrode surfaces in electrochemical energy systems

of Atomic Layer Deposition (ALD). ALD is an unparalleled nanoscale thin film deposition and surface functionalization method for nanotechnology applications. It offers atomic level thickness and compositional

Postdoctoral researcher with expertise in Atomic Layer Deposition for electrochemical applications

electrode stability and reactivity challenges. The group is world-renown for the precise fabrication of thin films through ALD and possesses strong experience in structural and electrochemical

PhD Position in Physics: Metal Nanoparticle Nucleation during the Initial Stages of Atomic Layer Deposition

deposition technique to grow conformal thin films on 3D surfaces with sub-monolayer thickness control. However, ALD growth of metals on oxide surfaces typically results in islands growth, yielding oxide