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over a very large area, using sputtering deposition techniques. The overall objective of the project is to define the parameters of this technology (integration of high-performance phase-change materials
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dynamics simulations to understand the growth mechanisms of thin films deposited by magnetron sputtering, with or without ion beam assistance (IBAS), particularly for metallic materials (Ag) and oxides (ZnO
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Additional Information Eligibility criteria • PhD in experimental physics or a related field • Experience in cryogenics appreciated • Experience in thin film deposition by sputtering desirable • Experience in
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