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) Machine Learning aided multimodal data analysis and reaction mechanism determination. You will contribute to the synthesis of thin-film and nanoparticle electrocatalyst libraries in collaboration with other
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of organic-inorganic hybrid thin films and their applications as next-generation extreme ultraviolet lithography (EUVL) photoresists. You will explore atomic layer deposition (ALD) techniques, including vapor
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hybrid EUV photoresist thin films on semiconductor substrates. In this postdoc position, you will be a member of the Interface Science and Catalysis group and interact strongly with other researchers
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