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methods to image complex wafer metrology targets and to improve the precision of modern methods of alignment and overlay metrology for the semiconductor industry. As a Postdoctoral Researcher, you will play
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structures, as well as environmental factors. Using these new models, you will probe how defects affect the electronic and mechanical properties of the system, and assess the effect of ambient environment
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deformations on the scale of only a few atomic spacings are starting to challenge the future of nanolithography technology, limiting the achievable feature size in semiconductor chips. In this project, you will
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of semiconductor devices. Friction-induced stresses and deformations on the scale of only a few atomic spacings are starting to challenge the future of nanolithography technology, limiting the achievable feature
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18 May 2024 Job Information Organisation/Company ARCNL Research Field Physics Researcher Profile First Stage Researcher (R1) Country Netherlands Application Deadline 13 Nov 2024 - 07:54 (UTC) Type of Contract Temporary Job Status Not Applicable Hours Per Week 40.0 Is the job funded through the...
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predict interfacial structures for your 2D material/oxide materials interfaces, directly taking into account disorder and non-ideal structures, as well as environmental factors. Using these new models, you
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14 May 2024 Job Information Organisation/Company ARCNL Research Field Physics Researcher Profile First Stage Researcher (R1) Country Netherlands Application Deadline 2 Nov 2024 - 12:18 (UTC) Type of Contract Temporary Job Status Not Applicable Hours Per Week 40.0 Is the job funded through the EU...
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combined with an interest in computational imaging algorithms with metrology applications. Knowledge of (computational) imaging technology, experimental optics, advanced programming methods and/or
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improve the precision of modern methods of alignment and overlay metrology for the semiconductor industry. As a Postdoctoral Researcher, you will play a pivotal role in our cutting-edge research efforts
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Interaction group focuses on developing the science and technology of new optical and optical/acoustic hybrid metrology modalities for nanolithography applications. Projects include ultra-high frequency