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media. The new approach will enable imaging and accurate characterization of nanostructures for the semiconductor industry. Optical metrology is a key ingredient of nanolithography, as it enables
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Research Infrastructure? No Offer Description Work Activities The goal of the project is to develop new machine learning frameworks for high-resolution optical imaging and metrology. You will use the new
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The goal of the project is todevelop new machine learning frameworks for high-resolution optical imaging and metrology. You will use the new methods to image complex wafer metrology targets and to
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