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of the Materials and Surface Science for EUV Lithography group E-mail: [email protected] Phone: +31- 20 851 7100 Application You can respond to this vacancy online via the button below. Please annex
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Research Infrastructure? No Offer Description Work Activities The goal of the project is to develop new machine learning frameworks for high-resolution optical imaging and metrology. You will use the new
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The goal of the project is todevelop new machine learning frameworks for high-resolution optical imaging and metrology. You will use the new methods to image complex wafer metrology targets and to
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