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Research Infrastructure? No Offer Description Work Activities Surface reactions live in plasma environment This postdoc position connects the two active research fields of surface science and plasma
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collaborate with researchers from Computational Imaging, EUV Generation and Imaging, and High Harmonic Generation and EUV Science groups. The position will involve close collaboration with researchers
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on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research
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. This postdoc position connects the two active research fields of surface science and plasma chemistry. The project aims to understand the active state of a surface live during plasma exposure using a unique
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Generation and Imaging, and High Harmonic Generation and EUV Science groups. The position will involve close collaboration with researchers of the Amsterdam Machine Learning Lab of UvAand researchers
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at just 13.5nm wavelength. The recent revolutionary introduction of EUV lithography (EUVL) was the culmination of several decades of collaborative work between industry and science – a Project Apollo
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at just 13.5nm wavelength. The recent revolutionary introduction of EUV lithography (EUVL) was the culmination of several decades of collaborative work between industry and science – a Project Apollo