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) / InP contact layer (200 nm) / Si substrate The objective of the project is to develop a plasma etching process for this multilayer stack, enabling selective etch stopping on the InP contact layer, which
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the development and operation of superconducting qubits. You will be working closely with PhD students and other postdoctoral researchers and will be able to benefit from the expertise developed there and
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Programme? Not funded by a EU programme Is the Job related to staff position within a Research Infrastructure? No Offer Description The postdoctoral researcher will carry out their activities within
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