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, and analyzing experiments to develop advanced plasma, vapor or combined plasma/vapor etch processes. Investigating novel process concepts, materials, and dry etch chemistries to address future device
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is intended to strengthen Diagnostics of radiation sources and low-temperature plasma, spectroscopic studies in atomic, molecular and ionic systems. The successful candidate will contribute to research
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date: 18.09.2026 Job description: DESY DESY expands its research on novel laser-plasma accelerators (LPAs) for future applications in health, photon science, and particle physics. At the core of these
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Chemistry Minimum Requirements PhD with 5-7 years minimum experience with ion source, plasma physics, atomic physics, accelerator physics, and technology or related field Desired Qualifications Demonstrated
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Dipartimento di Ingegneria Elettrica ed Energetica - Sapienza Univerisità di Roma | Roma, Lazio | Italy | 2 months ago
Description The research activity focuses on R&D related to the advancement of technologies for plasma-facing components in magnetic fusion nuclear reactors, particularly with regard to innovative, low
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We are seeking a highly motivated and enthusiastic Postdoctoral Research Associate with an interest in human plasma proteomics to join a pioneering project exploring the links between genetics and
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Energimyndigheten, Formas and Vinnova. Read more: https://impactinnovation.se/program/swedish-metals-minerals/ Your work assignments As a PhD student in this project, you will work in a world-leading group
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Sign In Create Profile Office Administrator - Nuclear, Plasma, and Radiological Engineering Urbana, IL, United States | 1038152 Apply Now Share Save Job Back to Search Office Administrator Nuclear
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Dhabi https://nyuad.nyu.edu/en/ NYU Abu Dhabi is the first comprehensive liberal arts and research campus in the Middle East to be operated abroad by a major American research university. Times Higher
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and plasma etch technology, ultimately develop a layer of amplified spontaneous emission mitigation (ASE) nanostructures on a new class of active mirror to underpin the next generation of thin-disk