2 plasma-processing Postdoctoral positions at CNRS

Researcher(M/F) – Development of Plasma Etching Processes for III-V Lasers for Silicon Photonic Integration

CNRS | Grenoble, Rhone Alpes | France | 10 days ago

) / InP contact layer (200 nm) / Si substrate The objective of the project is to develop a plasma etching process for this multilayer stack, enabling selective etch stopping on the InP contact layer, which

Postdoctoral Researcher (M/F): Functionalization of Magnetic Nanoparticles by Plasma Polymerization

CNRS | Mulhouse, Alsace | France | 10 days ago

for developing and optimizing plasma-based functionalization processes for ferrimagnetic nanoparticles. The successful candidate will be responsible for investigating the relationships between plasma parameters