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the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) and beyond-EUV light for nanolithography. In our group’s research we, for example, uncovered the quantum origins
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(beam profile, shape, current, stability) and implement closed-loop beam conditioning informed by metrology feedback. Atmospheric Pressure Plasma Jet/Figuring (APPJ/APPF) Develop process recipes (gases
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Massachusetts Institute of Technology | Cambridge, Massachusetts | United States | about 2 months ago
theoretical familiarity with many process categories (e.g. lithography,ALD, ALE, plasma etching, PECVD deposition, diffusion, etc.), but in-depth knowledge of ALD and/or plasma etching is required; expertise in
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Selection process Pre-selection: Candidates will be assessed based on their CV, motivation, research experience and overall suitability for the proposed project. Interviews: Shortlisted candidates will be
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been evolving towards architectures inspired by biological neural systems. In particular, neuromorphic photonics aims to develop artificial photonic neurons that process information through sparse, event
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APPLICATION INSTRUCTIONS: CURRENT PENN STATE EMPLOYEE (faculty, staff, technical service, or student), please login to Workday to complete the internal application process . Please do not apply
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reactor design, and plasma-catalyst interactions. Your research will focus on non-thermal plasma playing a pivotal role in the electrification of the chemical industry. Among various processes
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, the precipitation of carbides disrupts the macroscopic flow of carbon. Additional complexities come from the process, which includes pulses of enrichment separated by diffusion stages, and from the coexistence
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diversity of platforms and building blocks. The foundry model is now becoming established where Process Design Kits (PDKs) allow fabless designers to create their own chips with custom functionality. While
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at international conferences are also expected from the successful candidate. The project encompasses process development, plasma analysis, and the synthesis and characterization of thin films. It focuses