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. Applicants should have a PhD, or have passed their PhD viva, in plasma science, physics, electrical engineering or a closely related discipline. Essential experience includes previous research on plasma-liquid
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criteria The candidate should hold a PhD in plasma physics and chemistry, materials science, surface science, polymer chemistry, or a closely related scientific field. Experience in low-pressure plasma
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) / InP contact layer (200 nm) / Si substrate The objective of the project is to develop a plasma etching process for this multilayer stack, enabling selective etch stopping on the InP contact layer, which
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international conferences. - PhD in plasma physics or related field. - Demonstrated knowledge of basic plasma physics. - Experience in developing analytical models and software development. - Documented
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Max Planck Institute for Nuclear Physics, Heidelberg | Heidelberg, Baden W rttemberg | Germany | about 11 hours ago
Molecular Physics (Quantum Dynamics) as well as Particle and Astroparticle Physics. The Astrophysical Plasma Theory Group (Dr. Brian Reville) offers a Postdoc position (m/f/d). Your field of activity Work in
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spanning photonics, AI-driven ALD, and energy materials. Information Within the Plasma & Materials Processing group at Eindhoven University of Technology (TU/e), you will join a growing research effort in
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We are looking for an enthusiastic and highly motivated Postdoctoral Researcher to join our dynamic research team in the interdisciplinary field of plasma catalysis. This is a unique opportunity to
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Profile PhD in microengineering, electrical engineering, mechanical engineering, applied physics, materials science, or a closely related field Strong hands-on experience in MEMS or micro/nanofabrication
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knowledge Ability to collaborate with industrial partners Strong record of publications in a closely related field Specific Requirements Required PhD in Plasma Physics, Engineering or a closely related field
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postdoctoral position lies at the interface of fluid mechanics, phase-change physics, and industrial application. It is part of ARCNL’s Source Department and the EUV Plasma Processes group. We investigate