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Civil Service under reference CJU-010000-2025-0005, as part of the Recovery, Transformation and Resilience Plan (PRTR). Where to apply Website https://jobs.icfo.eu/?detail=1150 Requirements Research
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experience. Required Skills: Ability to work independently on various process and metrology tools used in cleanroom/semiconductor research laboratory involving inorganic and organic materials/thin films. Must
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STFP Home sign in | focus RAP opportunity at National Institute of Standards and Technology NIST Nondestructive defect detection metrology for semiconductor manufacturing Location
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University of North Carolina at Charlotte | Charlotte, North Carolina | United States | about 10 hours ago
internationally recognized for research programs in advanced manufacturing, precision metrology, battery research, motorsports/automotive engineering, control systems, computational mechanics, as well
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internationally recognized for research programs in advanced manufacturing, precision metrology, battery research, motorsports/automotive engineering, control systems, computational mechanics, as well
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Eindhoven University of Technology (TU/e) | Eindhoven, Provincie Noord-Brabant | Netherlands | 2 months ago
do that a single layer cannot? Emerging applications in semiconductor metrology, advanced microscopy, and sensing demand greater bandwidth, efficiency, and control over light. In this Postdoc project
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University of North Carolina at Charlotte | Charlotte, North Carolina | United States | about 10 hours ago
programs in advanced manufacturing, precision metrology, battery research, motorsports and automotive engineering, control systems, computational mechanics, hypersonics, transport phenomena, and
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of a research project on bedload metrology. He will be responsible for: 1) Designing and supervising the implementation of experimental devices to measure bedload transport. 2) Coordinating field
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enabling critical CMOS devices through the development of innovative contact etch processes, working closely with integration, metrology, and device teams to support the device fabrication flow. The
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metrology is based on state-of-the-art broadband AFM near field imaging systems with modifications allowing nanoscale measurement and control of electromagnetic properties. 1. Berweger S