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deformations on the scale of only a few atomic spacings are starting to challenge the future of nanolithography technology, limiting the achievable feature size in semiconductor chips. In this project, you will
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catalysis by inhibiting the design of dedicated plasma catalysts. This PhD position links surface science and plasma catalysis, aiming to understand the active state of a surface live during plasma exposure
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Universiteit Amsterdam (VU) en de fabrikant van halfgeleiderapparatuur ASML. ARCNL is gevestigd op het Amsterdam Science Park en heeft ongeveer 100 medewerkers. Zie ook www.arcnl.nl Je zal deel uitmaken van een
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group The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily
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on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research
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13.5nm wavelength. The recent revolutionary introduction of EUV lithography (EUVL) was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the
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. This postdoc position connects the two active research fields of surface science and plasma chemistry. The project aims to understand the active state of a surface live during plasma exposure using a unique
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Generation and Imaging, and High Harmonic Generation and EUV Science groups. The position will involve close collaboration with researchers of the Amsterdam Machine Learning Lab of UvAand researchers
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Interaction group focuses on developing the science and technology of new optical and optical/acoustic hybrid metrology modalities for nanolithography applications. Projects include ultra-high frequency
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at just 13.5nm wavelength. The recent revolutionary introduction of EUV lithography (EUVL) was the culmination of several decades of collaborative work between industry and science – a Project Apollo