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ICFO is offering a Staff Research Engineer position for an experienced engineer with extensive expertise in optical lithography and nanofabrication. The successful candidate will be responsible
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). For more details, please view: https://www.ntu.edu.sg/eee The L. J. Wong Group on X-ray & Free Electron Quantum Nanophotonics is a leading research group in X-ray photonics, having been recognized as a
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experiments Experience with microchannel, microfluidic, flow-cell, or microreactor systems is strongly preferred Experience with PDMS-based microfluidic device fabrication or soft lithography is an advantage
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include: Device design and nanofabrication of van der Waals heterostructures based on twisted 2D materials (dry transfer, cleanroom lithography, encapsulation) Cryogenic optoelectronic and magneto-transport
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a leading role in driving InP-based photonic integration towards the next level. A key enabler for our work is our state-of-the-art Nanolab cleanroom facility (http://www.tue.nl/nanolab ), which hosts
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by a EU programme Is the Job related to staff position within a Research Infrastructure? No Offer Description Fabrication of devices via optical lithography using metal/ferromagnet/oxide multilayers
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@TU/e cleanroom facility (http://www.tue.nl/nanolab ), which hosts a state-of-the-art 4” processing line for III-V semiconductors, including an ASML DUV scanner, AIXTRON MOCVD G10 epitaxy reactor
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nanofabrication, including electron-beam or optical lithography, thin-film deposition, etching, or atomic layer deposition. Optical spectroscopy, confocal microscopy, time-resolved spectroscopy, or single-photon
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Massachusetts Institute of Technology | Cambridge, Massachusetts | United States | about 2 months ago
lithography, etch and deposition techniques, proper chemical handling, safety and storage, and support system maintenance and service. For a full job description, please click here: https://mitnano.mit.edu
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facilities available in the C2N cleanroom. Electron-beam lithography, laser lithography, reactive ion etching, wet chemical etching, and metal deposition techniques will be employed. - low-temperature