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Eindhoven University of Technology (TU/e) | Eindhoven, Provincie Noord-Brabant | Netherlands | about 2 months ago
state-of-the-art 4” processing line for III-V semiconductors, including an ASML DUV scanner, AIXTRON MOCVD G10 epitaxy reactor, electron beam lithography, diverse plasma etching tools, wafer-level
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Eindhoven University of Technology (TU/e) | Eindhoven, Provincie Noord-Brabant | Netherlands | about 2 months ago
lithography, diverse plasma etching tools, wafer-level bonding equipment and others. The position builds on the pioneering work in the foundry production of complex photonic integrated circuits in the JePPIX
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International Iberian Nanotechnology Laboratory (INL) | Braga, Braga | Portugal | about 2 months ago
Python/Matlab or similar. Other Valued Skills Experience in literature research. Experience in nanofabrication – design or fabrication (e.g., lithography processes, etching processes). Experience in
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experience with microfabrication processes, including etching (wet and/or dry), thin film deposition, lithography, or related techniques. Working knowledge of hazardous gas systems, gas cabinets, and
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solid substrates. Background Molten droplets impacting colder surfaces are encountered in applications ranging from EUV lithography to metal additive manufacturing and droplet-based printing. During
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several fields such as quantum technologies, photonics, renewable energy and microsystems to name just a few. For more information, please see https://www.aalto.fi/en/otanano . Your role and goals You will
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patterns into 2D materials and their supporting layers using electron beam lithography, etching, thin film deposition and related nanofabrication. Fabricate devices in which the engineered materials can be
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laboratory and its research programs. Basic Qualifications: Applicants should have: Hands-on experience in micro/nanofabrication, preferably including lithography, thin-film deposition, dry/wet etching
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high-Q optical cavities , and a suitable fibre-to-chip coupling scheme for millikelvin operation will be developed using two-photon lithography . The devices will then be packaged for the millikelvin
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-photon lithography. The devices will then be packaged for the millikelvin refrigerator, combining optical and microwave access with the thermal anchoring and low heat load required there. The goal of