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. Investigating the etching mechanisms and selectivity of InP and InGaAlAs films as a function of plasma parameters using ellipsometry, XPS and AFM. 2. Developing an etching process for the multilayer stack meeting
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, AFM, ellipsometry, or TEM will be considered an asset. The successful candidate should also demonstrate: - strong experimental skills; - the ability to independently design and conduct experiments
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FieldPhysicsYears of Research Experience1 - 4 Additional Information Eligibility criteria -The candidate should have demonstrated experience in the synthesis, characterization (X-ray diffraction (XRD
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group at C2N. - characterisation of the doping profile and structural properties of the superconducting films and devices using X-ray diffraction (XRD), transmission electron microscopy (TEM), and