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RAP opportunity at National Institute of Standards and Technology NIST Nondestructive Evaluation of Additively Manufactured Alloys Location Material Measurement Laboratory, Applied Chemicals and
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to take FDS and Smokeview to the next level in compute performance while maintaining a practical, user-friendly code environment for engineers who are not experts in high-performance computing. key
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of electrochemical interfaces remain elusive. Moreover, our current understanding of electrostatic environments in nanoscale confinement (e.g., in the vicinity of nanopores) is severely lacking. These shortcomings
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prepared in a slit jet nozzle and from an effusive beam source. Fragmentation products are detected after passing the seeded gas through a heated quartz pyrolysis source or following electric discharge in a
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surfaces take advantage of the increased electrical functionality, chemical and structural robustness, wealth of fabrication knowledge, and present a less disruptive technology compared with monolayers
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RAP opportunity at National Institute of Standards and Technology NIST Femtosecond Time-Resolved Measurements in Semiconductor Materials Location Physical Measurement Laboratory, Nanoscale
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RAP opportunity at National Institute of Standards and Technology NIST Computational Fluid Dynamics & Quantum Algorithms (Multiphase Systems) Location Material Measurement Laboratory, Applied
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RAP opportunity at National Institute of Standards and Technology NIST Femtosecond Time-resolved Optical Measurements in Condensed Matter Location Physical Measurement Laboratory, Nanoscale
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RAP opportunity at National Institute of Standards and Technology NIST Atomistic Modeling of Phonons in Nanodiamonds and other Nanomaterials Location Material Measurement Laboratory, Applied
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traditional thin-film devices include exceptional structural quality, high surface-to-volume ratio, bottom-up device engineering with high-density on-chip integration, and utilization of quantum size effects