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the Department of Chemical Engineering and Chemistry at TU/e (The Netherlands), ASML and M2i -Materials Innovation Institute who will coordinate the project. The TU/e offers academic education that is driven by
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of performance of select designs in close collaboration with ASML, while in project 2 you will demonstrate salient mechanisms in optical experiments at AMOLF performed with help of a research technician. The
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the key reaction intermediates of plasma-catalytic reactions. About the group The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current
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group The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily
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solution, but the technique still has major, fundamental shortcomings. ARCNL , Delft University of Technology and ASML will join forces to get a better understanding of the causes of current limitations
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for Nanolithography, we work with ASML on new processes to fabricate the electronic chips that power nearly every sector in the world. These chips are fabricated onto silicon wafers. During fabrication, nanometre scale
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for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private
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for Nanolithography (ARCNL) and the companies ASML and Delmic. About the group The Photonic Materials group (www.erbium.nl), led by Prof. Albert Polman, studies light-matter interactions at the nanoscale. The group is
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) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between