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-beam and optical lithography, atomic layer deposition, reactive-ion etching, focused ion beam, and a new 700-square-meter cleanroom. Measuring: dilution refrigerators down to millikelvin, low
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-characterization facilities. Available infrastructure includes atomic layer deposition, electron microscopy, scanning-probe methods, x-ray techniques, ellipsometry, and spectroscopy. The combination of
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facilities. Available infrastructure includes atomic layer deposition, electron microscopy, scanning-probe methods, x-ray techniques, ellipsometry, and spectroscopy. The combination of these
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layer deposition, electron microscopy, scanning-probe methods, x-ray techniques, ellipsometry, and spectroscopy. The combination of these facilities gives the researcher the possibility to move from