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Field
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particularly valuable. Documented experience in materials characterization, such as NMR spectroscopy, mass spectrometry, X-ray diffraction, X-ray photoelectron spectroscopy, vibrational spectroscopy, and
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and spectroscopy measurements About the Team You will become part of a highly collaborative team of physicists and engineers from Argonne’s High Energy Physics (HEP), X-ray Science (XSD), and Materials
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(both X-ray and neutrons). Other characterization studies will be implemented as appropriate for the materials including photoelectron spectroscopy and impedance spectroscopy. Applicants will be expected
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. The position is an exciting opportunity for a candidate looking to work in a highly collaborative environment across many closely connected teams. The DanMAX beamline, in the Hard X-ray Group at MAX IV, is a
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. The position is an exciting opportunity for a candidate looking to work in a highly collaborative environment across many closely connected teams. The DanMAX beamline, in the Hard X-ray Group at MAX IV
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start date. ● Experience with cryogenic electron tomography. ● Experience with soft x-ray tomography. ● Experience with molecular biology techniques. Preferred Qualifications: ● Experience
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Helmholtz-Zentrum Dresden-Rossendorf - HZDR - Helmholtz Association | Tremblay en France, le de France | France | 2 months ago
partners (www.malar-project.eu ). Your tasks # Providing support during user operation at the XES station (dedicated to high-energy-resolution X-ray Spectroscopy) and coordination with the assigned local
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, including textural characterization, powder X-ray diffraction, electron microscopy, and other spectroscopic analyses. Demonstrated experience executing catalytic reactions with solid catalysts in batch and/or
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metrics such as specific capacity, Coulombic efficiency, rate capability, and cycle life. Perform comprehensive pre- and post-cycling characterization of materials using analytical techniques such as X-ray
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Laser Doping or Pulsed Laser Induced Epitaxy, allowing the fabrication of ultra-doped Si:B layers, well above the B solubility limit in Si. The films will be characterized by X-Ray Diffraction