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10 Oct 2026 Job Information Organisation/Company CNRS Department Centre de Recherche Paul Pascal Research Field Chemistry Physics » Chemical physics Physics » Biophysics Researcher Profile First Stage Researcher (R1) Application Deadline 30 Oct 2026 - 23:59 (UTC) Country France Type of...
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results in restricted formal contexts. The objective of the proposed PostDoc is to work at the intersection of model counting and machine learning, with the aim of significantly improving counting
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through the EU Research Framework Programme? Not funded by a EU programme Is the Job related to staff position within a Research Infrastructure? No Offer Description Lithosphere-scale processes control
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. In healthy cells, it is highly concentrated in the cytosolic leaflet of the plasma membrane, where it is essential for regulating cell polarity and signaling reactions. The goal of this project is to
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3 Oct 2026 Job Information Organisation/Company CNRS Department Unité de Mathématiques Pures et Appliquées Research Field Anthropology Anthropology » Ethnology Researcher Profile First Stage Researcher (R1) Application Deadline 23 Oct 2026 - 23:59 (UTC) Country France Type of...
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of metastable states and low-energy pathways between them, and determining when and how constrained dynamical trajectories select these structures over more typical ones. The postdoc will (a) contribute to the
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four main objectives: - Design and fabricate foam-bonded granular materials, by controlling formulation parameters, shaping processes, and binder solidification. - Characterize the microstructure
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18 Sep 2026 Job Information Organisation/Company CNRS Department Systèmes moléculaires et nano matériaux pour l'énergie et la santé Research Field Chemistry Biological sciences Pharmacological sciences Researcher Profile First Stage Researcher (R1) Application Deadline 8 Oct 2026 - 23:59...
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missions operated by LATMOS. The postdoc will employ deep learning approaches using satellite data and ground stations. -Understanding the infrared data from the IASI mission and identifying the channels
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) / InP contact layer (200 nm) / Si substrate The objective of the project is to develop a plasma etching process for this multilayer stack, enabling selective etch stopping on the InP contact layer, which