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The Fraunhofer Institute for Electron Beam and Plasma Technology FEP is located in Dresden and focuses on developing innovative solutions, technologies and processes for surface modification
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years of experience with extensive expertise in microelectronics and microsystems technology. Our wide range of technologies spans from advanced semiconductor processes and MEMS technologies to innovative
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manufacturers and R&D partners in clean room and laboratory areas at the "An der Bartlake" site. The CNT offers process and technology developments as well as services at Ultra Large Scale Integration (ULSI
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, material sciences, engineering, or a related field. Solid knowledge of semiconductor physics, lasers, and optics. Ideally, experience in the field of transmission electron microscopy. High level of self
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technology—is offering the opportunity to write a thesis on the topic: Stress Analysis of USP Laser Structuring in Sapphire. Modern laser processes such as selective laser etching (SLE) are used to fabricate
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Engineering, Mechatronics, or a comparable programme You are interested in application-oriented research at the intersection of photonics and semiconductor manufacturing You work organised, structured, and
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technology, offers the opportunity to write a master's thesis on the topic: In-situ analysis of UKP laser structuring in sapphire. Modern laser processes such as Selective Laser-induced Etching ( (SLE) are
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In cooperation with the Chair of Laser Technology (LLT), the Fraunhofer Institute for Laser Technology (ILT)—Europe’s leading center for contract research and development in the field of laser
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« (CNT) conducts research on 300 mm wafers for microchip manufacturers, suppliers, device manufacturers, and R&D partners. We offer process and technology developments as well as services at the ULSI
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along the entire semiconductor value chain and on tailer-made synthetic diamonds. Whether high-frequency circuits for communications technology, voltage converter modules for electromobility, laser