Sort by
Refine Your Search
-
Listed
-
Category
-
Country
-
Program
-
Field
-
: The postdoctoral researcher will work on the patterning of metal oxide surfaces by ion beam sputtering and on the growth of gold clusters under ultrahigh vacuum (UHV) conditions. Where to apply E-mail enrico.gnecco
-
. The successful applicant will be employed to work on the BEAMS trial which is a multicentre two-arm parallel randomised controlled trial with internal pilot that seeks to assess the clinical and cost-effectiveness
-
framework of project “RePowerSiC – High-Efficiency High-Power Laser Beaming In-Space Systems Based on SiC”, with grant agreement no. 101160868, financed by the European Commission, in the scope of the Horizon
-
PhD thesis student (f/m) at ESRF and University of Bath to study CO₂ capture by coupling X-ray Raman
University of Bath’s English language entry requirement (https://www.bath.ac.uk/corporate-information/postgraduate-research-degrees-english-language-requirements-for-international-students/ ). If the applicant
-
be found on the following ORNL Neutron Sciences website: https://neutrons.ornl.gov/suites/diffraction As part of our research team, you will emphasize developing software analysis tools for multi
-
of the project] * Background of the recruitment and description of the project As the driving force of the RIKEN RI Beam Factory (RIBF) — the world's most advanced heavy-ion accelerator facility — the Accelerator
-
behavior in D/B interaction. To circumvent this issue, the PhD candidate will fabricate B films on W and WOx substrates using a recently purchase electron-beam evaporator. Such source will allow to produce
-
large number of elements, from sulphur to bismuth . The optical scheme guaranteed a stable and spatially homogeneous beam over the whole energy range, and the detection system assured high quality data in
-
of infrastructure components for irradiation of biological samples. Planning and conducting experiments in radiation beams with high particle flux density / high dose rates, including at international research
-
. Responsibilities Fabrication (45%): ? Photolithography (contact/flood exposure and maskless/direct-write) ? Thin-film deposition (e-beam evaporation, sputtering) ? Lift-off process development and optimization