-
(PTM/PCM)) and to implement it to produce a large-scale device. The main activities are aimed at: - Depositing GeTe films with different stoichiometries using DC magnetron sputtering - Investigating
-
dynamics simulations to understand the growth mechanisms of thin films deposited by magnetron sputtering, with or without ion beam assistance (IBAS), particularly for metallic materials (Ag) and oxides (ZnO
Enter an email to receive alerts for magnetron-sputtering-"https:" positions