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. Investigating the etching mechanisms and selectivity of InP and InGaAlAs films as a function of plasma parameters using ellipsometry, XPS and AFM. 2. Developing an etching process for the multilayer stack meeting
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, AFM, ellipsometry, or TEM will be considered an asset. The successful candidate should also demonstrate: - strong experimental skills; - the ability to independently design and conduct experiments
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conditions, avoiding any air exposure prior to ions or plasma. A series of surface science and plasma techniques, including X-ray Photoelectron Spectroscopy (XPS), in-situ Spectroscopic Ellipsometry, gas-phase
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