41 physics-engineer "https:" "https:" "https:" "https:" "https:" "https:" positions at Argonne
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The Medium Energy Physics (MEP) group at Argonne National Laboratory invites applications for multiple experimental postdoctoral researcher positions. Depending on your background, your portfolio may
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nanoscience and nanotechnology. We seek a highly motivated scientist to help advance CNM’s research leadership in microelectronics, with particular emphasis on device physics, transport measurements
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Argonne National Laboratory invites applications for the position of Group Leader for the Low-Energy Nuclear Physics Research Group (LER) within the Physics Division. LER is the largest research
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The High Energy Physics (HEP) Division, in collaboration with the Materials Science Division (MSD) and Q-NEXT at Argonne National Laboratory, seeks a postdoctoral researcher to focus on applied
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The Chemical Sciences and Engineering Division at Argonne National Laboratory invites applications for a regular, full-time Assistant Computational Chemist / Chemical Engineer position. The
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, Physics, Chemistry, or a related field, and a minimum of 4+ years of related experience Proven research track record in deploying automated and autonomous platforms and AI/ML towards accelerating science
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://github.com/AD-SDL/MADSci AD-SDL organization on GitHub: https://github.com/AD-SDL Position Requirements Minimum of a Ph.D. in Computer Science, Materials Science, Physics, Chemistry, or a related field
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availability. Relevant Publications: 1. P. Chen et al., Ultrafast photonic micro-systems to manipulate hard X-rays at 300 picoseconds, Nat Commun, 10:1158 (2019). https://doi.org/10.1038/s41467-019-09077-1. 2
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solver, capable of running simulations on the Aurora supercomputer, using AMReX ( https://amrex-codes.github.io/amrex/ ) and the lattice Boltzmann method (LBM). The candidate will develop flow/geometry
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materials. The focus is to develop novel electrochemical deposition methods, control interfacial reaction kinetics, and engineer functional coatings and thin films. Advanced process design and