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At the Advanced Research Center for Nanolithography (ARCNL) we carry out exciting fundamental physics research at the highest possible level with relevance to key technologies in nanolithography. We
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)” at the Advanced Research Center for Nanolithography (ARCNL). Project goal In the SURPLAS project, we will determine the surface reaction mechanisms of catalysts in plasma and demonstrate the rational design of
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addition to carrying out your research program, you are also expected to coach a PhD candidate working on a related topic. About the group The Advanced Research Center for Nanolithography (ARCNL) focuses
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group The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily
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design (SURPLAS)” at the Advanced Research Center for Nanolithography (ARCNL). Project goal In the SURPLAS project, we will determine the surface reaction mechanisms of catalysts in plasma and demonstrate
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opportunities). Cooperation within a large team of PhD students and postdoc and with a large industrial partner. The opportunity to find the true origins of EUV light! About the group The Advanced Research Center
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apply and develop your data analysis skills. Cooperation within a large team of PhD students and postdoc and with a large industrial partner. About the group The Advanced Research Center
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to apply and develop your data analysis skills. Cooperation within a large team of PhD students and postdoc and with a large industrial partner. About the group The Advanced Research Center
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Supportive supervision and guidance About the group The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in
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at the Dutch semiconductor manufacturing equipment company ASML. About the group The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and