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29 Aug 2026 Job Information Organisation/Company ARCNL Research Field Engineering » Computer engineering Engineering » Precision engineering Physics » Computational physics Physics » Metrology
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activities of the Source Department aim at an atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV
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the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) and beyond-EUV light for nanolithography. In our group’s research we, for example, uncovered the quantum origins
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postdoctoral position lies at the interface of fluid mechanics, phase-change physics, and industrial application. It is part of ARCNL’s Source Department and the EUV Plasma Processes group. We investigate