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the fundamental dynamics of liquid-tin targets and plasmas that underpin present and future extreme-ultraviolet (EUV) light sources for nanolithography. This project is carried out in close collaboration with
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activities of the Source Department aim at an atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV
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application. It is part of activities in ARCNL’s Source Department. The research activities of the Source Department aim at an atomic- and molecular-level understanding of the fundamental dynamics in
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structures with extraordinary precision and do so quickly enough to keep up with large-scale production. This creates a fascinating computational challenge: how can we infer hidden physical properties from