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into practical design principles for low-debris surfaces and operating windows in advanced EUV source environments. Qualifications You have (or will soon obtain) a PhD in (Applied) Physics, Mechanical Engineering
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essential. Work environment ARCNL performs fundamental research, focusing on the physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor
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Strong verbal and written communication skills in English are required Work environment ARCNL performs fundamental research, focusing on the physics and chemistry involved in current and future key
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