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the fundamental dynamics of liquid-tin targets and plasmas that underpin present and future extreme-ultraviolet (EUV) light sources for nanolithography. This project is carried out in close collaboration with
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information for reliable parameter reconstruction. You will work in close collaboration with the research department at ASML, the Centrum Wiskunde & Informatica (CWI, Prof. dr. Tristan van Leeuwen), and the
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decades of collaborative work between industry and science – a Project Apollo of the digital age. The short, 13.5-nm EUV wavelength enables patterning the smallest, smartest, and most energy-efficient
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The revolutionary introduction of EUV lithography was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the digital age. The short, 13.5-nm EUV wavelength