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machine learning and physics to recover nanoscale information from imperfect images? Modern computer chips are built with features only a few nanometers across, yet manufacturers need to measure these
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postdoctoral position lies at the interface of fluid mechanics, phase-change physics, and industrial application. It is part of ARCNL’s Source Department and the EUV Plasma Processes group. We investigate
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activities of the Source Department aim at an atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV
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the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) and beyond-EUV light for nanolithography. In our group’s research we, for example, uncovered the quantum origins