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industry. Our group combines precision experiments, advanced imaging, and modeling to uncover the physics of tin droplets under extreme conditions of laser irradiation. We have established a strong track
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activities of the Source Department aim at an atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV
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AI4Science Lab, Informatics Institute, University of Amsterdam (dr. Patrick Forré), combining industrial relevance with academic depth in computational science and mathematical modeling. Qualifications You
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the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) and beyond-EUV light for nanolithography. In our group’s research we, for example, uncovered the quantum origins