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will allow you to not only design new material solutions, but show how these will perform in practice as an energy or nanolithography material. You will develop a computational framework to model and
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at the surface. You will learn to prepare atomically clean surfaces in ultra-high vacuum and perform spectroscopy experiments to determine their active state live during exposure to plasma. Using photoelectron
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freedom. Collaboration with the in-house theory group, allowing you to develop a thorough understanding of the underlying target dynamics. A wide range of existing (image) data analysis tools, allowing you
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