Sort by
Refine Your Search
-
optimization, and neural network techniques. Fabrication processes will involve electron beam lithography, atomic layer deposition, dry and wet etching, and scanning electron (SEM) or scanning ion (FIB
-
extract nanoscale dimensional information well below conventional diffraction limits. These measurements are optimized by tailoring the illumination so as to yield dimensionally sensitive 3-D
Searches related to electron diffraction
Enter an email to receive alerts for electron-diffraction positions