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. Investigating the etching mechanisms and selectivity of InP and InGaAlAs films as a function of plasma parameters using ellipsometry, XPS and AFM. 2. Developing an etching process for the multilayer stack meeting
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processes, plasma polymerization, thin-film deposition, surface functionalization, or materials characterization will be highly valued. Experience with magnetic nanoparticles and techniques such as XPS, FTIR
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